Texas Instruments DMOS Phase II

Texas Instruments, Inc. DMOS 5, Phase II, includes the construction of a three-story Computer Wafer Fabrication facility. The building is designed around a 65,000 SF clean room with support area of 455,000 SF for systems servicing the clean room function. Additionally, a five-story Administration Building of 120,000 SF was required for the administrative functions of the clean room. Also included is a chemical dock and a deionized water building.

This complex, totaling 650,000 SF is connected to an existing operating clean room facility – DMOS 5 Phase I and required a 12-month construction schedule. DMOS 5 Phase II is an addition to Phase I, which was also completed by Rogers-O’Brien.